MITTEL UND VERFAHREN ZUM SELEKTIVEN CHEMISCHEN ENTFERNEN HARTER OBERFLAECHENUEBERZUEGE VON SUBSTRATEN

The composition comprises an aqueous solution of H2SO4, a nitro- substituted aromatic compound, and optionally a fluoride ion producing species, and a surfactant. The composition can selectively remove hard surface layers deposited through flame, plasma spray, and detonation gun techniques on supera...

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Bibliographische Detailangaben
Hauptverfasser: SULLIVAN, THOMAS F, BURNS, DEBRA A, BLEEKS, THOMAS W, BRINDISI, FRANK, JUN
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:The composition comprises an aqueous solution of H2SO4, a nitro- substituted aromatic compound, and optionally a fluoride ion producing species, and a surfactant. The composition can selectively remove hard surface layers deposited through flame, plasma spray, and detonation gun techniques on superalloy substrates by contacting the above stripping solution in a heated bath wherein the bath is continuously agitated by an ultrasonic agitation means.