Perfume composn for cosmetics and clean-ing composns
Odiferous and/or aromatic cpds. of formula (in which R1 and R2 are H or CH3 (at least 1 or R1 and R2 = H) X is C=O or CHOH, R3 isopropyl isopropenyl, or isopropylidene, and a double or single carbon-carbon bond) are prepd. by reacting a cpd:- with an a cpsn. of formula The cpd. produced i.e. may be...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Odiferous and/or aromatic cpds. of formula (in which R1 and R2 are H or CH3 (at least 1 or R1 and R2 = H) X is C=O or CHOH, R3 isopropyl isopropenyl, or isopropylidene, and a double or single carbon-carbon bond) are prepd. by reacting a cpd:- with an a cpsn. of formula The cpd. produced i.e. may be hydrogenated or reduced to give cpds. of formula I(a) and I(b) resp. Cpd. I(a) may be reduced to give a cpd. of formula:- Cpds. may be used as perfumes for cleaning products including detergents, polishes, washing powders etc. or in cosmetics e.g. soap, lotions, bath additives, creams etc. |
---|