Perfume composn for cosmetics and clean-ing composns

Odiferous and/or aromatic cpds. of formula (in which R1 and R2 are H or CH3 (at least 1 or R1 and R2 = H) X is C=O or CHOH, R3 isopropyl isopropenyl, or isopropylidene, and a double or single carbon-carbon bond) are prepd. by reacting a cpd:- with an a cpsn. of formula The cpd. produced i.e. may be...

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Bibliographische Detailangaben
Hauptverfasser: EDWARD,ERICKSON,ROBERT, BOZZATO,GIULIANO,DR, MESARO,MARIO,DR, HUG-INDERBITZIN,MARIANNE, SCHUDEL,PETER,DR
Format: Patent
Sprache:eng ; ger
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Beschreibung
Zusammenfassung:Odiferous and/or aromatic cpds. of formula (in which R1 and R2 are H or CH3 (at least 1 or R1 and R2 = H) X is C=O or CHOH, R3 isopropyl isopropenyl, or isopropylidene, and a double or single carbon-carbon bond) are prepd. by reacting a cpd:- with an a cpsn. of formula The cpd. produced i.e. may be hydrogenated or reduced to give cpds. of formula I(a) and I(b) resp. Cpd. I(a) may be reduced to give a cpd. of formula:- Cpds. may be used as perfumes for cleaning products including detergents, polishes, washing powders etc. or in cosmetics e.g. soap, lotions, bath additives, creams etc.