Verfahren zur Herstellung von metallorganischen Komplexverbindungen

In the electrolytic deposition of metals from organo-metal complexes, a suitable electrolyte for depositing Al, Zn, Ga, and In, is made by adding a compound of formula MeX1mRn to a compound of formula [R1R2R3R4Y]X2, where Me i Al, Zn, Ga, In, X1 and X2 are halogen, sulphate, cyanide, oxide or trifluoro methyl, R is alkyl of 1 - 6 C atoms, Y is N, P, Te, or As, and R1R2R3R4 of which one or more is phenyl, benzyl, aplobenzyl or strongly branched hydrocarbon of 3 to 12 C atoms and the remainder is alkyl of 1 - 4 C atoms. 1 to 2 mols of the metal complex is added to 1 mol of the second compound with solvents e.g. aromatic hydrocarbons or ethers if necessary. A typical product is [(CH3)3 (C6H5 CH2)N]F.2Al(C2H5)3, and is not spontaneously ignitable, or fuming in air. A table of examples of metal complexes is given with their conductivities. In examples, the aluminium complex diluted with toluene is used to plate copper, brass, nickel, or a molybdenum wafer at 2-5-3V with stirring. If toluene is omitted an atmosphere of inert gas is used. The electrolytes may be used for making semi-conductors, or super conductive elements.