ADDITIVE CHEMICAL VAPOR DEPOSITION METHODS AND SYSTEMS

Disclosed are a system for additive chemical vapor deposition (CVD) and (CVD) methods for producing free-standing 3D metal deposits with controlled crystal size. La présente invention concerne un système de dépôt chimique en phase vapeur (CVD) additif et des procédés de CVD permettant de produire de...

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Bibliographische Detailangaben
1. Verfasser:	TEREKHOV, DMITRI S
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed are a system for additive chemical vapor deposition (CVD) and (CVD) methods for producing free-standing 3D metal deposits with controlled crystal size. La présente invention concerne un système de dépôt chimique en phase vapeur (CVD) additif et des procédés de CVD permettant de produire des dépôts métalliques 3D autonomes ayant une taille de cristal contrôlée.