VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE

The present invention relates to A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility comprising a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thicknes...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BONNEMANN, REMY, PACE, SERGIO, SILBERBERG, ERIC
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a Vacuum deposition facility comprising a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thickness, wherein the coating is deposited homogenously such that the maximum thickness of the coating can exceed the average thickness of 15% maximum and a vacuum deposition facility. La présente invention concerne un procédé de dépôt continu, sur un substrat en défilement, de revêtements formés à partir d'au moins un métal au sein d'une installation de dépôt sous vide comprenant une chambre à vide ; un substrat revêtu d'au moins un métal sur les deux côtés du substrat possédant une épaisseur moyenne, le revêtement étant déposé de manière homogène de sorte que l'épaisseur maximale du revêtement puisse dépasser l'épaisseur moyenne de 15 % au maximum, et une installation de dépôt sous vide.