DEEP BRAIN STIMULATION LEAD
A neurological lead, including a planar-formed cylindrical film including a distal end and a proximal end. The planar-formed cylindrical film further including a ribbon cable extending from the distal end into a lumen defined by the planar-formed cylindrical film; a first polymeric layer; a first si...
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Format: | Patent |
Sprache: | eng ; fre |
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Zusammenfassung: | A neurological lead, including a planar-formed cylindrical film including a distal end and a proximal end. The planar-formed cylindrical film further including a ribbon cable extending from the distal end into a lumen defined by the planar-formed cylindrical film; a first polymeric layer; a first silicon based barrier layer at least partially disposed over the first polymeric layer; a first metal layer at least partially disposed over the first barrier layer, a second silicon based barrier layer at least partially disposed over the first metal layer; and a second polymeric layer at least partially disposed over the second barrier layer. The first metal layer including: a plurality of electrodes; a plurality of periphery traces each at least partially encircling a perimeter of a respective one of the plurality of electrodes; and at least two connection points coupling each of the traces to a respective one of the electrodes.
La présente invention concerne un système et des procédés pour une électrode de stimulation cérébrale profonde. En particulier, l'invention concerne une électrode de stimulation qui comprend une ou plusieurs couches barrières à base de silicium situées à l'intérieur d'un film MEMS. Les couches barrières à base de silicium permettent d'améliorer la fiabilité et la durabilité. Les couches barrières à base de silicium permettent également d'améliorer l'adhérence entre les couches du film MEMS. |
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