METALLIC BIPOLAR PLATE WITH RESILIENT SEAL COMPRISING BEAD WITH ELASTOMER-FILLED RECESS, AND ELECTROCHEMICAL SYSTEM COMPRISING SAME

The subject-matter relates to a metallic bipolar plate (9) for an electrochemical system (1) which comprises a resilient sealing arrangement (11) with at least one bead (20) extending parallel to the plane of plate of the bipolar plate (9); wherein the bead (20) orthogonal to the course of the bead...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GAUGLER, BERND, ORUC, AHMET
Format: Patent
Sprache:eng ; fre
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The subject-matter relates to a metallic bipolar plate (9) for an electrochemical system (1) which comprises a resilient sealing arrangement (11) with at least one bead (20) extending parallel to the plane of plate of the bipolar plate (9); wherein the bead (20) orthogonal to the course of the bead (20) in each case comprises an M-shaped cross section with lateral elevations (30a, 30b) and a recess (31) formed between the lateral elevations (30a, 30b); wherein the lateral elevations (30a, 30b) comprise inner flanks (38a, 38b) pointing towards the recess (31) and a flank height (t1) of the inner flanks (38a, 38b) extends orthogonal to the plane of plate from the vertex (35) of the recess (31), which is a deepest point of the recess (31), until a crest (32a, 32b) of the respective lateral elevation (30a, 30b), which is a highest point of the lateral elevation (30a, 30b); and wherein the recess (31) is filled with an elastomer (21); wherein the elastomer (21) over the entire course of the bead (20) orthogonally to the plane of plate projects over the crests (32a, 32b) of the lateral elevations (30a, 30b) and that the elastomer (21) along the entire course of the bead (20) starting from the vertex (35) of the recess (31) of the M-shaped cross section of the bead (20) at least over 50 percent of the flank height (t1) reaches to the inner flanks (38a, 38b) of the lateral elevations (30a, 30b) and covers them, so that during compression of the bipolar plate (9) orthogonal to the plane of plate the compression force exerted on the elastomer (21) is introduced via the elastomer (21) into the bead (20). Moreover, the subject-matter also relates to an electrochemical system. L'invention concerne une plaque bipolaire métallique (9) destinée à un système électrochimique (1), qui comprend un agencement d'étanchéité élastique (11) comportant au moins un cordon (20) s'étendant parallèlement au plan de plaque de la plaque bipolaire (9). Le cordon (20), perpendiculairement à la direction du cordon (20) dans chaque cas, présente une section transversale en M comprenant des élévations latérales (30a, 30b) et un creux (31) formé entre les élévations latérales (30a, 30b). Les élévations latérales (30a, 30b) comprennent des flancs internes (38a, 38b) dirigés vers le creux (31) et une hauteur de flanc (t1) des flancs internes (38a, 38b) s'étend perpendiculairement au plan de plaque depuis le sommet (35) du creux (31), qui est un point le plus profond du creux (31), jusqu'à une cr