METHOD FOR DETERMINING A CONCENTRATION OF METAL IMPURITIES CONTAMINATING A SILICON PRODUCT

A method determines a concentration of metal impurities contaminating a silicon product. The method comprises obtaining a test sample of the silicon product with the metal impurities disposed thereon. The test sample is placed within a first vessel. A first acid solution is added to the first vessel...

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Bibliographische Detailangaben
Hauptverfasser:	WORKMAN, DALE FRANKLIN, KRESZOWSKI, DOUGLAS H, PUEHL, CARL W., III
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY NON-METALLIC ELEMENTS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method determines a concentration of metal impurities contaminating a silicon product. The method comprises obtaining a test sample of the silicon product with the metal impurities disposed thereon. The test sample is placed within a first vessel. A first acid solution is added to the first vessel containing the test sample. The test sample is submerged into the first acid solution to produce a mixed solution comprising the first acid solution, the metal impurities, and digested silicon. The undigested silicon is separated from the mixed solution. The mixed solution is analyzed to determine the concentration of metal impurities contaminating the silicon product.