APPARATUS AND METHOD FOR THE PLASMA COATING OF A SUBSTRATE, IN PARTICULAR A PRESS PLATEN

An apparatus (100..103) for the plasma coating of a substrate (2), in particular a press platen, is provided, comprising a vacuum chamber (3) and, arranged therein, an electrode (400..409), which is segmented, wherein each of the electrode segments (500..512) has a dedicated connection (6) for an el...

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Bibliographische Detailangaben
Hauptverfasser:	PROSCHEK, MICHAEL, STORI, HERBERT, LAIMER, JOHANN, GEBESHUBER, ANDREAS, MULLER, THOMAS, STADLER, OTTO, HEIM, DANIEL
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PRESSES PRESSES IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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