ELECTRODE COATING APPARATUS AND METHOD

A coating deposition apparatus has first and second charge sources. The first charge source is chargeable to a first voltage potential and the second charge source is chargeable to a second voltage potential. The coating deposition apparatus also has a first output terminal and a deposition substanc...

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Bibliographische Detailangaben
Hauptverfasser:	SCOTCHMER, NIGEL, LEUNG, CHEUK H, CHAN, KEVIN R
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A coating deposition apparatus has first and second charge sources. The first charge source is chargeable to a first voltage potential and the second charge source is chargeable to a second voltage potential. The coating deposition apparatus also has a first output terminal and a deposition substance connected thereto, and a second output terminal for connection to a workpiece. The consumable deposition substance is movable relative to the workpiece. The first charge source is connected between the first and second terminals whereby the first voltage potential is established therebetween. The second charge source is connected between the terminals. The coating deposition apparatus also has discharge control circuitry connected to the first and second charge sources to inhibit discharge of the second charge source through the terminals prior to commencement of discharge of the first charge source through the terminals.