SEMICONDUCTOR STRUCTURE AND PROCESS FOR FORMING OHMIC CONNECTIONS TO A SEMICONDUCTOR STRUCTURE

A semiconductor apparatus is disclosed. The apparatus includes a first do ped volume of semiconductor material, the first doped volume having a front surface and first and second adjacent regions. The first region has a first concentration of dopant and a first exposed area on the front surface. The...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: RUBIN, LEONID B
Format: Patent
Sprache:eng ; fre
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!