HYDROGEN OR HELIUM PERMEATION MEMBRANE AND STORAGE MEMBRANE AND PROCESS FOR PRODUCING THE SAME

A hydrogen permeation membrane that selectively allows the passage of hydrog en and that can be formed in a desired shape is obtained by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2, 6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating tha...

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Bibliographische Detailangaben
Hauptverfasser:	IKEDA, SHINICHI, ABE, HIDEO, OGASAWARA, ARIYOSHI, UMEYAMA, NORIO, TANAKA, YASUHITO
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS THEREOF INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A hydrogen permeation membrane that selectively allows the passage of hydrog en and that can be formed in a desired shape is obtained by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2, 6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300.degree.C or higher is obtained in a sintering process at temperature of 200.degree.C to 500.degree.C, thereby providing a hydrogen or helium permeation membrane that has excellent water resistance. Similarly, a hydrogen or helium storage membrane that selectively stores hydrogen and that can be formed in a desired shape can be formed by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2, 6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300.degree.C or higher is obtained in a sintering process at temperature of 200.degree.C to 500.degree.C, thereby providing a hydrogen or helium storage membrane that has excellent water resistance.