METHODS FOR FABRICATING ISOLATED MICRO- AND NANO- STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY

The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding o...

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Bibliographische Detailangaben
Hauptverfasser:	SAMULSKI, EDWARD T, DENISON, GINGER M, MAYNOR, BENJAMIN W, EXNER, ANSLEY E, SAMULSKI, R. JUDE, EULISS, LARKEN E, ROLLAND, JASON P, DESIMONE, JOSEPH M
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY HUMAN NECESSITIES HYGIENE MATERIALS THEREFOR MEDICAL OR VETERINARY SCIENCE MICROSTRUCTURAL TECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques. La présente invention a trait à l'utilisation de matériaux à base d'élastomère fluoré, notamment des matériaux à base de polyéther perfluoré, dans des applications lithographiques molle ou d'impression haute résolution, telles que le moulage de répliques à l'échelle micronique ou nanométrique, et le moulage par premier contact à l'échelle nanométrique de matériaux organiques pour la génération d'éléments de haute fidélité au moyen d'un moule élastomérique. Par conséquent, la présente invention a trait à un procédé pour la production de nanostructures isolées autoportantes de toute forme au moyen de techniques de lithographie molle ou d'impression.