LAYER PROCESSING

Layer processing to grow a layer structure upon a substrate surface comprise s supplying a vapour mixture stream to the substrate (28) to deposit constituents, monitoring growth with an ellipsometer (12) and using its outp ut in real-time growth control of successive pseudo-layers. A Bayesian algori...

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Hauptverfasser: RUSSELL, JOHN, ROBBINS, DAVID JOHN, PICKERING, CHRISTOPHER, MARRS, ALAN DOUGLAS, DANN, ALLISTER WILLIAM ELON, GLASPER, JOHN LEWIS
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:Layer processing to grow a layer structure upon a substrate surface comprise s supplying a vapour mixture stream to the substrate (28) to deposit constituents, monitoring growth with an ellipsometer (12) and using its outp ut in real-time growth control of successive pseudo-layers. A Bayesian algorith m is used to predict a probability density function for pseudo-layer growth parameters from initial surface composition, growth conditions and associate d growth probabilities therewith, the function comprising discrete samples. Weights are assigned to the samples representing occurrence likelihoods base d on most recent sensor output. A subset of the samples is chosen with selecti on likelihood weighted in favour of samples with greater weights. The subset provides a subsequent predicted probability density function and associated pseudo-layer growth parameters for growth control, and becomes a predicted probability density function for a further iteration of pseudo-layer growth.