DIRECTED ENERGY ASSISTED IN VACUO MICRO EMBOSSING

Various configurations of a directed energy assisted micro embossing machine/station in a vacuum chamber (7) utilized in a continuous manufacturing process and the web structure products (4) made by that process (optical disks, cards, tapes, holographic reflectors, diffusers, binary optical elements...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	KIME, MILFORD B
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULARARTICLES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	Various configurations of a directed energy assisted micro embossing machine/station in a vacuum chamber (7) utilized in a continuous manufacturing process and the web structure products (4) made by that process (optical disks, cards, tapes, holographic reflectors, diffusers, binary optical elements, etc.) are disclosed. The configurations can include a single machine roll to roll system (2, 3) for embossing optical features on the surface of a single substrate (4) and applying appropriate metallic, dielectric, semiconductor, polymer and other coatings all in a vacuum chamber (7).