PROCESS AND DEVICE FOR GASIFICATION OF WASTE

A process and a device for gasification of waste is provided which allows economical operation at comparatively low flow rates. Gasification is performed in a gasifier having a gasification space (1) and a liquid rotating slag bath (2). Slag bath (2) is preferably caused to rotate by tangentially in...

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Bibliographische Detailangaben
Hauptverfasser: HALANG, SVEN, MARSCHNER, SIEGMAR
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:A process and a device for gasification of waste is provided which allows economical operation at comparatively low flow rates. Gasification is performed in a gasifier having a gasification space (1) and a liquid rotating slag bath (2). Slag bath (2) is preferably caused to rotate by tangentially injecting the gasification medium and/or at least a portion of the waste. While waste with a diameter of to 5 mm is introduced into the gasifier above slag bath (2), larger wastes are introduced directly into the slag bath.