FLEXIBLE PRINTED WIRING BOARD

A durable two-layer flexible printed wiring board which is improved in the persistence of tenacious adhesion after heat loading, particularly so improved in the tenacious adhesion between the copper film and the polyimide film after electroless plating as not to cause delamination even after exposur...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TOHYAMA, SHUNROKU, NISHIGAWA, TADAHIRO, YAMASHITA, MASAYUKI
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PERFORMING OPERATIONS PRINTED CIRCUITS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A durable two-layer flexible printed wiring board which is improved in the persistence of tenacious adhesion after heat loading, particularly so improved in the tenacious adhesion between the copper film and the polyimide film after electroless plating as not to cause delamination even after exposure to a temperature of as high as about 150 ~C for a period of as long as 10 days. The board is characterized by having a first deposited metal layer, on one or both surfaces of a polyimide film containing 0.02 to 1 wt.% (based on the film) of tin, in which part or the whole of the deposited metal is dispersed in the film in the thicknesswise direction toward the inside of the film from the surface thereof and whose thickness is 10 to 300 .ANG., inclusive of the layer wherein the metal is dispersed, and having a second deposited copper layer on the first deposited metal layer.