CARBON-COATED BARRIER FILMS WITH INCREASED CONCENTRATION OF TETRAHEDRALLY-COORDINATED CARBON

CARBON-COATED BARRIER FILMS WITH INCREASED CONCENTRATION OF TETRAHEDRALLY-COORDINATED CARBON

Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp3 tetrahedrally-coordinated carbon. The seed material provides a template for the...

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Bibliographische Detailangaben
1. Verfasser: WAGNER, JOHN RALPH JR
Format: Patent
Sprache:eng ; fre
Schlagworte:
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
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Beschreibung
Zusammenfassung:Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp3 tetrahedrally-coordinated carbon. The seed material provides a template for the replication of sp3 tetrahedrally-coordinated carbon atoms in the deposited amorphous carbon coating.