DEPOSITION OF TITANIUM ALUMINIDES

ABSTRACT There is disclosed a method for producing titanium aluminide coating on a substrate surface in which the step of supporting the substrate with the surface to be coated in a reactor chamber is used, and a flow of gaseous aluminum monochloride is provided as well as a flow of gaseous titanium...

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Bibliographische Detailangaben
Hauptverfasser:	BENANDER, ROBERT E, HOLZL, ROBERT A
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	ABSTRACT There is disclosed a method for producing titanium aluminide coating on a substrate surface in which the step of supporting the substrate with the surface to be coated in a reactor chamber is used, and a flow of gaseous aluminum monochloride is provided as well as a flow of gaseous titanium trichloride, at gas temperatures of between about 800° C and about 1200°, over the surface of the substrate. The substrate surface is maintained at a temperature below the temperature of the gases sufficient to cause disproportionation of the gases to deposit titanium and aluminum on the substrate. There is also disclosed products having a titanium aluminide coating. The coatings are of use in metal matrix compositions.