PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS AND METHOD FOR MAKING AND USING

PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS AND METHODS FOR MAKING AND USING A photosensitive polyamide acid composition consisting essentially of chemically combined units of the formula where R is a tetravalent organic radical or a tetravalent organosiloxane-containing radical, R1 is a divalent organ...

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Bibliographische Detailangaben
1. Verfasser:	KRAY, WILLIAM D
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Zusammenfassung:	PHOTOPATTERNABLE DIELECTRIC COMPOSITIONS AND METHODS FOR MAKING AND USING A photosensitive polyamide acid composition consisting essentially of chemically combined units of the formula where R is a tetravalent organic radical or a tetravalent organosiloxane-containing radical, R1 is a divalent organic radical or a divalent organosiloxane-containing radical, and A is a photoreactive acrylate, cinnamate or 2,3-diphenylcyclopro-penol ester containing radical.