X-RAY LITHOGRAPHY SYSTEM

Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask use...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	FORSYTH, JAMES M
Format:	Patent
Sprache:	eng ; fre
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask used in the lithographic process to displace the particles away from the mask. The sheet of gas may also be used to maintain a pressure differential across an opening in the evacuated chamber through which the X-rays pass towards the target. In addition, the gas sheet may be used to cool the X-ray mask by placing the mask close to the sheet but at a sufficient distance so that the sheet does not interfere with the mask.