PLANARIZING LAYER FOR SEMICONDUCTOR SUBSTRATES SUCH AS SOLID STATE IMAGERS

PLANARIZING LAYER FOR SEMICONDUCTOR SUBSTRATES SUCH AS SOLID STATE IMAGERS

PLANARIZING LAYER FOR SEMICONDUCTOR SUBSTRATES SUCH AS SOLID STATE IMAGERS A device is disclosed comprising a non-planar semiconductor substrate and a planarizing layer thereon, the planarizing layer having a maximum thickness that is no greater than about 3.mu. and a planarization factor P?1.0. In...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: PACE, LAUREL J, MCCOLGIN, WILLIAM C
Format: Patent
Sprache:eng ; fre
Schlagworte:
BASIC ELECTRIC ELEMENTS
CABLES
CONDUCTORS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INSULATORS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PLANARIZING LAYER FOR SEMICONDUCTOR SUBSTRATES SUCH AS SOLID STATE IMAGERS A device is disclosed comprising a non-planar semiconductor substrate and a planarizing layer thereon, the planarizing layer having a maximum thickness that is no greater than about 3.mu. and a planarization factor P?1.0. In a preferred embodiment, the layer comprises a polymer formed from a liquid monomer coated onto the substrate and thereafter polymerized.