HYDROGENATION PROCESS AND APPARATUS FOR SOLID STATE DEVICES

Le procédé, du type suivant lequel on crée un plasma d'hydrogène au voisinage des dispositifs à semiconducteur, est caractérisé en ce qu'on applique des moyens aptes à éloigner des dispositifs les particules de plasma polarisés positivement. The invention relates to a process and to an apparatus for treating semiconductor devices. A hydrogen plasma is created in the vicinity of the semiconductor devices and the positively polarized plasma particles are removed therefrom. A tightly sealed enclosure is provided and contains two plane, parallel electrodes polarized so as to form an anode and a cathode. Heating means are located in the vicinity of the anode.