PHOTOSENSITIVE UNILAYER FILM STRUCTURE CAST FROM A POLYMERIC EMULSION DISPERSION

A novel photosensitive film structure comprises a generally continuous first or minor phase material and a generally discontinuous second or major phase material. The first or minor phase includes a photosensitive compound whose solubility relative to a selected solvent changes upon exposure to electromagnetic radiation, while the second or major phase is not photosensitive nor soluble in the solvent. The two phases are uniformly interdispersed throughout the film structure. Imagewise exposure to electromagnetic radiation renders the film structure selectively permeable to the selected solvent, and, after development, the film structure exhibits the chemical and physical properties of the second or major phase material. The film structure finds varied application in the manufacture of graphic arts articles such as lithographic printing plates and photoresists.