METHOD FOR MANUFACTURING FILM THERMOPILE

ABSTRACT OF THE DISCLOSURE Disclosure is made of a method for manufacturing a film thermopile, whereby a film of thermoelectric semiconductor material which is n-type stoichiometric solid solution contain-ing Bi2Te3 and Sb2Te3 is deposited on a substrate. Then zone refinement is effected so that the...

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Hauptverfasser: SHMIDT, IGOR A, GELFGAT, DAVID M, DASHEVSKY, ZINOVY M, LIDORENKO, NIKOLAI S, KOLOMOETS, NIKOLAI V, CHERNOUSOV, LEV N, SGIBNEV, IGOR V, GRANOVSKY, VLADIMIR I, ZHEMCHUZHINA, ELENA A, NIKOLASHINA, LJUDMILA A
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:ABSTRACT OF THE DISCLOSURE Disclosure is made of a method for manufacturing a film thermopile, whereby a film of thermoelectric semiconductor material which is n-type stoichiometric solid solution contain-ing Bi2Te3 and Sb2Te3 is deposited on a substrate. Then zone refinement is effected so that the adjacent arms of the thermo-electric battery are at different temperatures, some at a tem-perature of not above 300°C, and others at a temperature of not less then 350°C.