COMPOSTOS MONOAZOICOS DE COMPLEXO DE COBRE PROCESSO PARA A SUA PREPARACAO E PROCESSO PARA O TINGIMENTO DE MATERIAL

1. Water-soluble copper complex monoazo compounds of the general formula (1) see diagramm : EP0069376,P18,F5 in which D denotes the radical of a diazo component of the benzene or naphthalene series whose metal-complexing hydroxy group, respectively oxy group, is in the ortho-position relative to the azo bridge, K is the radical of a coupling component of the benzene, naphthalene, pyridone or pyrazolone series, having a phenolic or enolic hydroxy group which complexes the copper, and to which coupling component the azo group has been coupled in the ortho-position relative to, or adjacent to, this phenolic or enolic hydroxy group, respectively oxy group, R is a hydrogen atom or an alkyl group of 1 to 4 C-atoms, Y denotes the radical of the formula -NH-, -N(lower alkyl)- or -CH2 -, n represents the number zero or 1, Z denotes the vinyl, beta-acetoxyethyl, beta-thiosulfatoethyl, beta-chloroethyl or beta-sulfatoethyl group, and X is a radical of the formula (2a), (2b) or (2c) -O-R**1 , -S-R**1 , see diagramm : EP0069376,P19,F1 in which R**1 denotes an optionally substituted, branched or unbranched alkyl radical, an optionally substituted aryl radical or an optionally substituted heteroaromatic radical, R**2 is a hydrogen atom or an optionally substituted, branched or unbranched alkyl radical or a cycloaliphatic radical and R**3 denotes a hydrogen atom or an optionally substituted, branched or unbranched alkyl radical or an optionally substituted aryl radical, R**1 , R**2 and R**3 being identical or different, or in which R**2 and R**3 together with the nitrogen atom, form a heterocyclic, saturated ring which may contain a further hetero atom, and in which the groups of the formula (3) and (4) see diagramm : EP0069376,P19,F3 -(Y)n -SO2 -Z in which R, X, Y, Z and n have the abovementioned meaning, are bonded to the radical D and to the radical K, either separately from one another or simultaneously to D or K.