aparelho cvd de plasma

A plasma CVD apparatus according to the present invention is provided with: a vacuum chamber 4; a pair of deposition rollers 2, 2, each of which is disposed in the vacuum chamber 4, and has a substrate W wound thereon, the substrate on which a coating is deposited; and magnetic field generating sections 8, 15, each of which forms a deposition area where the coating is deposited on the substrate W wound on each deposition roller 2 by generating a magnetic field that generates plasma on the surface of each deposition roller 2. The pair of deposition rollers 2, 2 are composed of a first deposition roller 2, and a second deposition roller 2, which is disposed at an interval from the first deposition roller 2 such that the shaft core of the second deposition roller is parallel to that of the first deposition roller 2. The magnetic field generating sections 8, 15 are disposed such that a first deposition area 19, as the deposition area, is formed in a space 3 between the pair of deposition rollers 2, 2, and that a second deposition area 20 is formed in a region adjacent to the surface of the deposition roller 2 and other than the space 3.