uso de derivados de organogeladores em compostos betuminosos para melhorar a resistência destes a tensão química

Use of an organogelator derivative (A) in a bituminous composition to improve the resistance of aggressive chemical agents of the bituminous composition, is claimed, where (A) has a molar mass of = 2000 g/mole and includes at least one hydrogen bond donor D, at least one hydrogen bond acceptor and a...

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Bibliographische Detailangaben
Hauptverfasser: RÉGIS VINCENT, JULIEN CHAMINAND, LAURENCE LAPALU, SYLVIA HARDERS
Format: Patent
Sprache:por
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Zusammenfassung:Use of an organogelator derivative (A) in a bituminous composition to improve the resistance of aggressive chemical agents of the bituminous composition, is claimed, where (A) has a molar mass of = 2000 g/mole and includes at least one hydrogen bond donor D, at least one hydrogen bond acceptor and at least one compatibilizing agent in the bitumen; and the compatibilizing agent includes a group comprising e.g. (a) at least one straight chain hydrocarbon including at least 4C. Use of an organogelator derivative (A) in a bituminous composition to improve the resistance of aggressive chemical agents of the bituminous composition, is claimed, where (A) has a molar mass of = 2000 g/mole and includes at least one hydrogen bond donor D, at least one hydrogen bond acceptor and at least one compatibilizing agent in the bitumen; and the compatibilizing agent includes a group comprising (a) at least one straight chain hydrocarbon including at least 4C, (b) at least one aliphatic ring having 3-8 atoms, (c) at least one aromatic ring, or (d) at least one aliphatic, partially aromatic or even completely aromatic condensed polycyclic system, each cycle including 5 or 6 atoms, alone or its mixture, with the exception of N,N'-ethylene bis(stearamide) and excluding fatty-chain polyamines obtained by reacting polyalkylene polyamines having fatty-chain of formula (R-NH-(CH 2-CH 2-CH 2-NH) n-H) (aa) with formic acid. R : optionally saturated linear 8-22C hydrocarbon chain; and n : 1-5.