Nitrated sulphonic acid compns

Sulphonic acid nitrated compsns. of formula R-NH-R1-NH-R (I) (where R is a radical of formula R1 is bivalent hydrocarbon or C = O, -OC-CH=CH-CO-, -OC-(CH2)n-CO- or R2 is hydrocarbon radical formula R3-N-R4 or -O-R5; X is alkylene or alkenylene radical or -NH-CO-NH-, -CH=CH-, -O-, -S-, -S-S-, -CO- et...

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Bibliographische Detailangaben
Hauptverfasser: D. VAN ASSCHE, H. UEHLINGER
Format: Patent
Sprache:eng ; fre
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Zusammenfassung:Sulphonic acid nitrated compsns. of formula R-NH-R1-NH-R (I) (where R is a radical of formula R1 is bivalent hydrocarbon or C = O, -OC-CH=CH-CO-, -OC-(CH2)n-CO- or R2 is hydrocarbon radical formula R3-N-R4 or -O-R5; X is alkylene or alkenylene radical or -NH-CO-NH-, -CH=CH-, -O-, -S-, -S-S-, -CO- etc; R3 and R4 each are H, (substd) hydrocarbon radical or (substd) heterocyclic radical; R5 is a R3 but not H and n is 0 to 12). The cpds. are used as dyestuffs for natural fibres such as cotton silk, leather, and synthetic materials such as Nylon 6, Nylon 6,6 etc. They have excellent stability to light and washing.