Gas supply system, exposure device, and method of producing device

A gas supply system and an exposure device, wherein exposure light is prevented from being attenuated by a light absorbing substance and is thereby allowed to reach a substrate in a stabilized manner without the optical characteristics of the exposure device being greatly affected. The gas supply sy...

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Bibliographische Detailangaben
Hauptverfasser:	MOTOKATSU IMAI, TOMONARI NAKAMURA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A gas supply system and an exposure device, wherein exposure light is prevented from being attenuated by a light absorbing substance and is thereby allowed to reach a substrate in a stabilized manner without the optical characteristics of the exposure device being greatly affected. The gas supply system comprises a feed pipe (30) for feeding a predetermined gas to a space (PA), a refiner (33) having a plurality of gas refining units (40, 41) for refining the predetermined gas from a gas to be refined, the feed pipe (30) being connected to the plurality of gas refining units (40, 41).