CLEANING APPARATUS AND PROCESS

Particles adhering to the internal surfaces of an object are removed by the movement of a shock wave past the surfaces. The shock wave is generated by the explosion of a gas in a chamber located inside the object. The invention has particular application for use in cleaning process equipment.

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Bibliographische Detailangaben
Hauptverfasser: KAM BOR LEE, DAN K. PUCKETT, ALLAN C. MORGAN, L. WILLARD RICHARDS
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Particles adhering to the internal surfaces of an object are removed by the movement of a shock wave past the surfaces. The shock wave is generated by the explosion of a gas in a chamber located inside the object. The invention has particular application for use in cleaning process equipment.