SOLAR CELL AND PREPARATION METHOD THEREFOR, AND PHOTOVOLTAIC SYSTEM

The present application relates to a preparation method for a solar cell, comprising the following steps: providing a silicon wafer substrate, the silicon wafer substrate being provided with a first surface and a second surface opposite to the first surface; sequentially depositing on the first surface of the silicon wafer substrate to form an oxide layer, a doped amorphous silicon film layer and a silicon oxide mask layer; annealing the silicon wafer substrate to convert the doped amorphous silicon film layer into a doped polycrystalline silicon film layer; and patterning the first surface by laser to damage or remove the silicon oxide mask layer and the doped polycrystalline silicon film layer in a preset area, and reserving the entire or part of the oxide layer to form a patterned area. According to the preparation method, when texturing is performed on the front surface of the silicon wafer substrate, the first surface corresponding to the patterned area on the back surface of the silicon wafer substrate can be effectively prevented from being textured, thereby improving the open-circuit voltage and the battery efficiency of the solar cell. Moreover, the present application relates to a corresponding solar cell and a photovoltaic system.