ASPARTIC ACID COMPOSITION, POLYSUCCINIMIDE COMPOSITION, POLYASPARTIC ACID COMPOSITION, AND CROSS-LINKED POLYASPARTIC ACID COMPOSITION

An aspartic acid composition including aspartic acid and an impurity, wherein the impurity includes at least one type of impurity selected from the group consiting of amino acids other than aspartic acid, organic acids, and salts of these, and the impurity content is 0.02 mass% to 1.1 mass%. A polys...

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Hauptverfasser: ARAI Tatsuhiko, KONDO Akihiro, MIURA Satomi, OKA Yasutaka, NAKAYASHIKI Toru, SASAMOTO Akane
Format: Patent
Sprache:eng
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Zusammenfassung:An aspartic acid composition including aspartic acid and an impurity, wherein the impurity includes at least one type of impurity selected from the group consiting of amino acids other than aspartic acid, organic acids, and salts of these, and the impurity content is 0.02 mass% to 1.1 mass%. A polysuccinimide production method that includes using said aspartic acid composition and subjecting said aspartic acid to a polymerization reaction. A polysuccinimide composition that is produced using said polysuccinimide production method.