Method for obtaining functionalized polymeric surfaces with photosensitizers, functionalized polymeric material and use thereof
The present invention describes methods for obtaining functionalized polymeric surfaces (MPn-PSm) from polymers or copolymers with appropriate functionalizations (X), which can be a halogen or a leaving group, such as polyvinyl chloride (MP1) and (Chloromethyl)polystyrene-Merrifield (MP2), and curcu...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The present invention describes methods for obtaining functionalized polymeric surfaces (MPn-PSm) from polymers or copolymers with appropriate functionalizations (X), which can be a halogen or a leaving group, such as polyvinyl chloride (MP1) and (Chloromethyl)polystyrene-Merrifield (MP2), and curcumin photosensitizers (PS1), |
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