Device for residual-monomer removal

A device for residual-monomer removal by which residual monomers can be efficiently removed from a slurry containing a vinyl-chloride-based resin, while preventing the residual monomers from being discharged from the process. The device for residual-monomer removal comprises: a column body 4; a plurality of perforated plates 34 disposed along the vertical direction within the column body; a plurality of chambers 16-21 formed respectively over the perforated plates serving as bottom surfaces; slurry introduction pipes 22 and 23; flow pipes 36 for causing the slurry to flow downward successively from the perforated plate beneath an upper chamber; a steam introduction pipe 10 disposed in the bottom part of the column body; a condenser 6 disposed over the upper part of the column body, with a gas discharge port 11 disposed therebetween; a slurry discharge port 24 provided to the lowermost perforated plate; and warm-water ejectors disposed just beneath the perforated plates and each including a warm-water ejection ring 38. Each warm-water ejector is provided with: a pressure gauge 40 for monitoring the ejection pressure to effectively conduct the ejection; a device for adjusting the pressure (a pressure control valve 32 or a warm-water pump 8 with inverter control); and a sight-glass-washing nozzle 37 connected to the upper part of the warm-water ejection ring 38 of the warm-water ejector or inserted into the ring.