System and method for estimating instrument location
Systems and methods for estimating instrument location are described. The methods and systems can obtain a first motion estimate based on robotic data and a second motion estimate based on position sensor data. The methods and systems can determine a motion estimate disparity based on a comparison o...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Systems and methods for estimating instrument location are described. The methods and systems can obtain a first motion estimate based on robotic data and a second motion estimate based on position sensor data. The methods and systems can determine a motion estimate disparity based on a comparison of the first and second motion estimates. Based on the motion estimate disparity, the methods and systems can update a weighting factor for a location derivable from the robotic data or a weighting factor for a location derivable from the position sensor data. Based on the updated weighting factor, the methods and systems can determine a location/position estimate for the instrument. The methods and systems can provide increased accuracy for a position estimate in cases where the instrument experiences buckling or hysteresis. |
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