Accuracy management method, accuracy management system, management device, analysis device, and method for determining abnormality in accuracy management

Provided are an accuracy management method, an accuracy management system, a management device, an analysis device, and a method for determining an abnormality in accuracy management, whereby the quality of accuracy management can be increased by adequately utilizing measurement results for both an...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Matsuoka, Kazuhiko, Fujimoto, Keiji, Hasui, Yasushi
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Provided are an accuracy management method, an accuracy management system, a management device, an analysis device, and a method for determining an abnormality in accuracy management, whereby the quality of accuracy management can be increased by adequately utilizing measurement results for both an accuracy management material and a sample. An accuracy management method used by a management device 30 connected via a network 13 to analysis devices 20 installed in each of a plurality of facilities 12, wherein first accuracy management information obtained by measurement of an artificially generated accuracy management material by the analysis device 20 of each facility 12 and second accuracy management information obtained by measurement of a plurality of samples are acquired via the network 13 from the analysis device 20 of each facility 12, and information relating to accuracy management of the analysis device 20 of at least one facility 12 is outputted on the basis of the acquired first accuracy management information and the second accuracy management information.