Apparatus for feeding a liquid material to an evaporator device

The invention relates to an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the apparatus comprises a container adapted to contain a liquid metal, a feed tube (15) from the closed container to the evaporator device and an electromagnetic pump (16) provided in...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Hamilton, Douglas Alexander, Zoestbergen, Edzo, Commandeur, Colin, Kaiser, Timothy Dean, Widdis, Stephen James, Bakker, Eduard Paul Mattheus, Hazelett, Peter William, Snijders, Roland Jan
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DIFFUSION TREATMENT OF METALLIC MATERIAL DYNAMO-ELECTRIC MACHINES ELECTRICITY GENERATION INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to an apparatus for feeding liquid metal to an evaporator device in a vacuum chamber, wherein the apparatus comprises a container adapted to contain a liquid metal, a feed tube (15) from the closed container to the evaporator device and an electromagnetic pump (16) provided in the feed tube, and wherein the electromagnetic pump is placed in a vacuum enclosure (18).