Method for observation state of optical path in optical emission spectroscopy of a sample and computer program product for a processing device
The invention relates to a method for observation state of optical path in optical emission spectroscopy of a sample (1). The method comprises a calculating step for (i) calculating a first ratio between a first emission line generated in a first analyzing step and a second emission line generated i...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention relates to a method for observation state of optical path in optical emission spectroscopy of a sample (1). The method comprises a calculating step for (i) calculating a first ratio between a first emission line generated in a first analyzing step and a second emission line generated in a first analyzing step and for (ii) calculating a second ratio between a subsequent first emission line generated in a second analyzing step and a subsequent second emission line generated in a second analyzing step and for (iii) calculating a difference between the first ratio and the second ratio to obtain a calculated intensity difference, the calculated intensity difference being indicative of cleanliness of optical path. The invention relates also to a computer program product for a processing device. |
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