Micro/nano structure origination method

A method of manufacturing an embossing master element is disclosed including the steps of providing a template carrying a plurality of precursor relief structures, reversibly modifying the precursor relief structures in selected areas corresponding to a desired pattern to form a negative of the embo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KARLO JOLIC, ROBERT LEE, PHEI LOK
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of manufacturing an embossing master element is disclosed including the steps of providing a template carrying a plurality of precursor relief structures, reversibly modifying the precursor relief structures in selected areas corresponding to a desired pattern to form a negative of the embossing master element and replicating the negative as a positive to form the embossing master element. The invention therefore provides a method for the origination of a range of individual surface relief microstructures or nanostructures from a single precursor generic microstructure or nanostructure via a process of selectively and locally modifying the surface relief of the precursor generic microstructure or nanostructure. Because the modification is reversible, the template carrying the relief structures may be reused, greatly reducing the cost of providing a variety of different security features.