Plasma electrode configuration for forming an electron sheath layer

The present disclosure provides for a method of treating tissue. The method includes the steps of: positioning a plasma device in spaced relation to target tissue in accordance with a target tissue effect and generating plasma including secondarily-emitted electrons sufficient such that the target t...

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Bibliographische Detailangaben
Hauptverfasser: COLLINS, GEORGE J, ANTIOCO, DOUGLAS K, CHO, JIN-HOON, KOO, IL-GYO, MOORE, CAMERON A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present disclosure provides for a method of treating tissue. The method includes the steps of: positioning a plasma device in spaced relation to target tissue in accordance with a target tissue effect and generating plasma including secondarily-emitted electrons sufficient such that the target tissue effect is achieved.