MICROMACHINED INTERGRATED FLUID DELIVERY SYSTEM WITH DYNAMIC METAL SEAT VALVE AND OTHER COMPONENTS

A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels...

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Bibliographische Detailangaben
Hauptverfasser:	ERICA, R. PORRAS, JOHN, W. LANE, MARK CROCKETT, MICHAEL, J. DECHELLIS, CHRIS MELCER, ANEESH KHULLAR, BALARABE, N. MOHAMMED
Format:	Patent
Sprache:	eng
Schlagworte:	ACTUATING-FLOATS BLASTING COCKS DEVICES FOR VENTING OR AERATING ENGINEERING ELEMENTS AND UNITS FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING ORCONTROL PURPOSES FLUID-PRESSURE ACTUATORS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HYDRAULICS OR PNEUMATICS IN GENERAL LIGHTING MECHANICAL ENGINEERING TAPS THERMAL INSULATION IN GENERAL VALVES WEAPONS
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Beschreibung
Zusammenfassung:	A space-conserving integrated fluid delivery system which is particularly useful for gas distribution in semiconductor processing equipment. The invention also includes an integrated fluid flow network architecture, which may include, in addition to a layered substrate containing fluid flow channels, various fluid handling and monitoring components. The layered substrate is diffusion bonded, and may be partially integrated or fully integrated into a processing chamber which also includes diffusion bonded layers.