TUN DISH AND METHOD FOR PRODUCTION OF A METAL STRIP OF HIGH PURITY
To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (k...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (kappa) of the refractory-lined surface area (Aref) to the filling volume (V) which is delimited by this refractory-lined surface area and the bath-level-dependent exposed surface area (ATop) and results from the relationship kappa = A ref ( V ) 2 3 be between 3.83 and 4.39. |
---|