TUN DISH AND METHOD FOR PRODUCTION OF A METAL STRIP OF HIGH PURITY

To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (k...

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Hauptverfasser: KARL MORWALD, GERALD ECKERSTORFER, HEINZ HODL, MARKUS BRUMMAYER, GERALD HOHENBICHLER
Format: Patent
Sprache:eng
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Zusammenfassung:To achieve the highest possible separation rate for foreign particles in a tundish combined, at the same time, with a minimized level of inclusions, the refractory-lined interior space of the tundish, as a function of an operating bath level (h), satisfies the condition that a dimensionless ratio (kappa) of the refractory-lined surface area (Aref) to the filling volume (V) which is delimited by this refractory-lined surface area and the bath-level-dependent exposed surface area (ATop) and results from the relationship kappa = A ref ( V ) 2 3 be between 3.83 and 4.39.