CHEMICAL VAPOR DEPOSITION VAPORIZER

A Chemical Vapor Deposition (CVD) vaporizer comprising: a liquid supply assembly having an environment supporting a liquid state for a plurality of precursor components of a liquid precursor blend; a venturi operative to atomize said liquid precursor blend; a vaporization chamber, located proximate...

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Bibliographische Detailangaben
Hauptverfasser:	ROBERT, W. GRANT, LARRY, D. MCMILLAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A Chemical Vapor Deposition (CVD) vaporizer comprising: a liquid supply assembly having an environment supporting a liquid state for a plurality of precursor components of a liquid precursor blend; a venturi operative to atomize said liquid precursor blend; a vaporization chamber, located proximate to said liquid supply assembly and said venturi, having an environment supporting a vapor state for said plurality of precursor components; and a thermal barrier located between said liquid supply assembly and said vaporization chamber enabling preservation of a large temperature disparity between said liquid supply assembly and said proximately located vaporization chamber.