VERFAHREN UND VORRICHTUNG ZUR CHEMISCHEN ABSCHEIDUNG AUS DER DAMPFPHASE
A chemical vapor deposition device having uniformly distributed heating means (8,10) substantially surrounding an inner deposition reaction chamber (18) for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an...
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creator | CAMPBELL, BRYANT A MILLER, NICHOLAS E |
description | A chemical vapor deposition device having uniformly distributed heating means (8,10) substantially surrounding an inner deposition reaction chamber (18) for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber (2). A purging gas may be introduced into the vacuum chamber to prevent leakage of reactant gas from the reaction chamber. |
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A purging gas may be introduced into the vacuum chamber to prevent leakage of reactant gas from the reaction chamber.</description><edition>4</edition><language>eng ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19891115&DB=EPODOC&CC=AT&NR=E47894T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19891115&DB=EPODOC&CC=AT&NR=E47894T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CAMPBELL, BRYANT A</creatorcontrib><creatorcontrib>MILLER, NICHOLAS E</creatorcontrib><title>VERFAHREN UND VORRICHTUNG ZUR CHEMISCHEN ABSCHEIDUNG AUS DER DAMPFPHASE</title><description>A chemical vapor deposition device having uniformly distributed heating means (8,10) substantially surrounding an inner deposition reaction chamber (18) for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber (2). 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A purging gas may be introduced into the vacuum chamber to prevent leakage of reactant gas from the reaction chamber.</abstract><edition>4</edition><oa>free_for_read</oa></addata></record> |
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language | eng ; ger |
recordid | cdi_epo_espacenet_ATE47894TT1 |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | VERFAHREN UND VORRICHTUNG ZUR CHEMISCHEN ABSCHEIDUNG AUS DER DAMPFPHASE |
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