VERFAHREN UND VORRICHTUNG ZUR CHEMISCHEN ABSCHEIDUNG AUS DER DAMPFPHASE

A chemical vapor deposition device having uniformly distributed heating means (8,10) substantially surrounding an inner deposition reaction chamber (18) for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an...

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Bibliographische Detailangaben
Hauptverfasser: CAMPBELL, BRYANT A, MILLER, NICHOLAS E
Format: Patent
Sprache:eng ; ger
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Zusammenfassung:A chemical vapor deposition device having uniformly distributed heating means (8,10) substantially surrounding an inner deposition reaction chamber (18) for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber (2). A purging gas may be introduced into the vacuum chamber to prevent leakage of reactant gas from the reaction chamber.