NANOLITHOGRAPHIEVORRICHTUNG MIT ABTASTSTRAHL UND BETRIEBSVERFAHREN DAFÜR

The invention relates to a scanning jet nanolithograph and to the operation method thereof comprising one or several nozzles used for producing one or several jets of a chemically or physically active agent which forms an image on a substrate or carries out the profile cutting of a processed materia...

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Bibliographische Detailangaben
1. Verfasser: TIMOSHCHENKO, IGOR ANDREEVICH
Format: Patent
Sprache:ger
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Zusammenfassung:The invention relates to a scanning jet nanolithograph and to the operation method thereof comprising one or several nozzles used for producing one or several jets of a chemically or physically active agent which forms an image on a substrate or carries out the profile cutting of a processed material. A nozzle is embodied in the form of an optical resonator and is made of an optically transparent nanometersized capillary, into wall of which a narrow band light radiation is introduced via a convergent light guide. The inventive method consists in producing a heterogeneous light pressure of one or several light sources on a jet with the aid of light pressure electrical modulation, thereby enabling said jet to carry out a three-dimensional scanning thorough the substrate whose size ranges from 1 to 10 cm 2 . The light radiation interruption interrupts the jet. A topological image application process is controllable directly in a real-time mode of a production process by using a wide aperture optical system for collecting the light radiation obtained by the contact of the jet with an object and by converting said light radiation into a computer-processable electrical signal. The time for applying a one-layer image to 1 cm 2 with a resolving capacity of 7,25x14,5 nm is equal to 1.5 min.