STYREN-BUTADIEN-STYREN-BLOCK-COPOLYMER AUF BASIS VON HAFTZUSAMMENSETZUNGEN MIT ERHÖHTER LICHTOXIDATIONS-RESISTENZ
The instant invention relates to styrene butadiene styrene based pressure sensitive adhesive compositions with improved photo-oxidation resistance containing N-methyl substituted sterically hindered amines as stabilizers. Further aspects of the invention are a process for the stabilization of butadi...
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| Zusammenfassung: | The instant invention relates to styrene butadiene styrene based pressure sensitive adhesive compositions with improved photo-oxidation resistance containing N-methyl substituted sterically hindered amines as stabilizers. Further aspects of the invention are a process for the stabilization of butadiene based pressure sensitive adhesive compositions and the use of N-methyl substituted sterically hindered amines as stabilizers for styrene butadiene styrene based pressure sensitive adhesives. |
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