DURCH WÄRME VERNETZBARE HYDROXYAMINO-UNTERSCHICHT FÜR LITHOGRAPHIE 193 MN

A photolithographic sensitive coated substrate comprising a thermally cured undercoat on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat.

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Bibliographische Detailangaben
Hauptverfasser:	FOSTER, PATRICK, BIAFORE, JOHN JOSEPH, STEINHAUSLER, THOMAS, SLATER, SIDNEY GEORGES, BLAKENEY, ANDREW J
Format:	Patent
Sprache:	ger
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COLOUR PRINTING COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FILLING PASTES HOLOGRAPHY INKS LINING MACHINES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS POLISHES PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES SEMICONDUCTOR DEVICES STAMPS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TYPEWRITERS USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	A photolithographic sensitive coated substrate comprising a thermally cured undercoat on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat.