FERROMAGNETISCHE RESONANZANREGUNG UND IHRE VERWENDUNG ZUR ERWÄRMUNG TEILCHENGEFÜLLTER SUBSTRATE

Process for heating a substrate, which contains, relative to the total weight of the substrate, 0.1 to 70 wt. % of metallic, magnetic, ferrimagnetic, ferromagnetic, antiferromagnetic or superparamagnetic particles having an average particle size of between 1 and 5000 nm, wherein the substrate is exp...

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Bibliographische Detailangaben
Hauptverfasser:	LAMMERSCHOP, OLAF, KIRSTEN, CHRISTIAN, N, SAUER, HANS-MARTIN, ROTH, MARCEL
Format:	Patent
Sprache:	ger
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON DYES ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS AS ADHESIVES
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Beschreibung
Zusammenfassung:	Process for heating a substrate, which contains, relative to the total weight of the substrate, 0.1 to 70 wt. % of metallic, magnetic, ferrimagnetic, ferromagnetic, antiferromagnetic or superparamagnetic particles having an average particle size of between 1 and 5000 nm, wherein the substrate is exposed to electromagnetic radiation, characterized in that the electromagnetic radiation comprises microwave radiation with a frequency in the range from 1 to 300 GHz and the substrate is simultaneously exposed to a direct-current magnetic field, the field strength of which is at least twice the strength of the earth's magnetic field; use of the process for producing or detaching adhesive bonds; device for the simultaneous production of microwave radiation with a frequency within the range from 1 to 300 GHz and a direct-current magnetic field, the field strength of which is at least twice the strength of the earth's magnetic field.